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	<title>MEMSuniverse &#187; three-dimension</title>
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		<title>Exposure System for three-dimensional microfabrication : DI</title>
		<link>http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di-2.html</link>
		<comments>http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di-2.html#comments</comments>
		<pubDate>Thu, 14 Aug 2008 12:30:08 +0000</pubDate>
		<dc:creator>admin</dc:creator>
				<category><![CDATA[Microfabrication]]></category>
		<category><![CDATA[engineering]]></category>
		<category><![CDATA[Exposure]]></category>
		<category><![CDATA[japan]]></category>
		<category><![CDATA[Science]]></category>
		<category><![CDATA[system]]></category>
		<category><![CDATA[three-dimension]]></category>

		<guid isPermaLink="false">http://www.memsuniverse.com/?p=526</guid>
		<description><![CDATA[DigInfo &#8211; http://movie.diginfo.tv Japan Science Engineering Co., Ltd., primarily manufactures exposure equipment for Flat Panel Displays but also design, produce, and market precision machinery, optical equipment, measuring equipment, and physiochemical equipment. At the 18th Finetech Japan exhibition they exhibited an &#8220;exposure system for three-dimensional microfabrication&#8221;. The new device is used in the fabrication of MEMS [...]]]></description>
			<content:encoded><![CDATA[<p><img src="http://img.youtube.com/vi/yR_OXNHOd6w/2.jpg" align="left">DigInfo &#8211; http://movie.diginfo.tv</p>
<p>Japan Science Engineering Co., Ltd., primarily manufactures exposure equipment for Flat Panel Displays but also design, produce, and market precision machinery, optical equipment, measuring equipment, and physiochemical equipment. At the 18th Finetech Japan exhibition they exhibited an &#8220;exposure system for three-dimensional microfabrication&#8221;. The new device is used in the fabrication of MEMS devices, which are devices that integrate elemental machine parts, sensors, actuators, and electronic circuits onto a single silicon substrate. </p>
<p>The new device, which is equipped with mobile mask exposure technology, causes the photo mask being exposed in the lithography process to move parallel to the resist surface with cyclical motion such as reciprocating or rotational motion, and as a result, the amount of exposure distribution on the resist surface is controlled, and a three-dimensional resist structure can be produced.</p>
<p>Duration : <b>0:1:47</b></p>
<p><span id="more-526"></span><br /></p>
<div class="crp_related"><h3>Related Posts:</h3><ul><li><a href="http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di.html" rel="bookmark" class="crp_title">Exposure System for three-dimensional microfabrication :</a></li><li><a href="http://www.memsuniverse.com/events/spie-lithography-asia-2010.html" rel="bookmark" class="crp_title">SPIE Lithography Asia 2010</a></li><li><a href="http://www.memsuniverse.com/microfabrication/small-nc-microfabrication-machine-diginfo-2.html" rel="bookmark" class="crp_title">Small NC Microfabrication Machine : DigInfo</a></li><li><a href="http://www.memsuniverse.com/microfabrication/small-nc-microfabrication-machine-diginfo.html" rel="bookmark" class="crp_title">Small NC Microfabrication Machine</a></li><li><a href="http://www.memsuniverse.com/nanotechnology/magic-mirrors-projecting-3d-illusions-diginfo.html" rel="bookmark" class="crp_title">Magic Mirrors Projecting 3D Illusions : DigInfo</a></li><li>Powered by <a href="http://ajaydsouza.com/wordpress/plugins/contextual-related-posts/" rel="external nofollow">Contextual Related Posts</a></li></ul></div>]]></content:encoded>
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		<item>
		<title>Exposure System for three-dimensional microfabrication :</title>
		<link>http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di.html</link>
		<comments>http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di.html#comments</comments>
		<pubDate>Fri, 25 Apr 2008 03:53:59 +0000</pubDate>
		<dc:creator>admin</dc:creator>
				<category><![CDATA[Microfabrication]]></category>
		<category><![CDATA[engineering]]></category>
		<category><![CDATA[Exposure]]></category>
		<category><![CDATA[japan]]></category>
		<category><![CDATA[Science]]></category>
		<category><![CDATA[system]]></category>
		<category><![CDATA[three-dimension]]></category>

		<guid isPermaLink="false">http://www.memsuniverse.com/?p=258</guid>
		<description><![CDATA[Japan Science Engineering Co., Ltd., primarily manufactures exposure equipment for Flat Panel Displays but also design, produce, and market precision machinery, optical equipment, measuring equipment, and physiochemical equipment. At the 18th Finetech Japan exhibition they exhibited an &#8220;exposure system for three-dimensional microfabrication&#8221;. The new device is used in the fabrication of MEMS devices, which are [...]]]></description>
			<content:encoded><![CDATA[<p><img src="http://img.youtube.com/vi/yR_OXNHOd6w/2.jpg" align="left" /></p>
<p>Japan Science Engineering Co., Ltd., primarily manufactures exposure equipment for Flat Panel Displays but also design, produce, and market precision machinery, optical equipment, measuring equipment, and physiochemical equipment. At the 18th Finetech Japan exhibition they exhibited an &#8220;exposure system for three-dimensional microfabrication&#8221;. The new device is used in the fabrication of MEMS devices, which are devices that integrate elemental machine parts, sensors, actuators, and electronic circuits onto a single silicon substrate.</p>
<p>The new device, which is equipped with mobile mask exposure technology, causes the photo mask being exposed in the lithography process to move parallel to the resist surface with cyclical motion such as reciprocating or rotational motion, and as a result, the amount of exposure distribution on the resist surface is controlled, and a three-dimensional resist structure can be produced.</p>
<p><span>DigInfo</span></p>
<p>Duration : <strong>0:1:47</strong></p>
<p><span id="more-258"></span></p>
<p><center><!--adsense#middle--></center></p>
<div class="crp_related"><h3>Related Posts:</h3><ul><li><a href="http://www.memsuniverse.com/microfabrication/exposure-system-for-three-dimensional-microfabrication-di-2.html" rel="bookmark" class="crp_title">Exposure System for three-dimensional microfabrication : DI</a></li><li><a href="http://www.memsuniverse.com/events/spie-lithography-asia-2010.html" rel="bookmark" class="crp_title">SPIE Lithography Asia 2010</a></li><li><a href="http://www.memsuniverse.com/microfabrication/small-nc-microfabrication-machine-diginfo.html" rel="bookmark" class="crp_title">Small NC Microfabrication Machine</a></li><li><a href="http://www.memsuniverse.com/microfabrication/small-nc-microfabrication-machine-diginfo-2.html" rel="bookmark" class="crp_title">Small NC Microfabrication Machine : DigInfo</a></li><li><a href="http://www.memsuniverse.com/events/photomask-japan-2010-17th-international-symposium-on-photomasks-and-ngl-masks-in-japan.html" rel="bookmark" class="crp_title">Photomask Japan 2010 &#8211; 17th International Symposium on Photomasks and NGL Masks in Japan</a></li><li>Powered by <a href="http://ajaydsouza.com/wordpress/plugins/contextual-related-posts/" rel="external nofollow">Contextual Related Posts</a></li></ul></div>]]></content:encoded>
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