SPIE Lithography Asia 2010

Event Details:

Start date : October 13, 2010
End date : October 15, 2010
Location : Incheon
Organized by : SPIE

Event Description:

It is our great pleasure to invite you to participate in the third SPIE Lithography
Asia conference, featuring presentations from leading researchers, developers,
and innovators, and building on last year’s very successful conference.

This is your opportunity to present your research and connect with others working
at the leading edge of semiconductor device and flat panel display (FPD) technologies.

Conference topics include:

• Emerging Lithographic Technology and Nanofabrication
  • Optical lithography extension (shorter than 157 nm)
  • E- and ion- beam technology
  • Nano-imprint lithography
  • Application on nanostructures
• Optical Microlithography
  • ArF immersion lithography
  • RET technology
  • Double exposure/double patterning lithography
  • OPC modeling
  • Photo cluster automation
• EUV Lithography
  • Patterning
  • Masks
  • Exposure Tools
  • Sources
  • EUV Resists
  • Environmental Control
• Advances in Resist Material and Processing
  • Emerging resist materials
  • Advancement in immersion resists
  • Resist process optimizations
  • Resist material for LCD application
  • Double exposure material
• Metrology, Inspection, and Process Control
  • Advancement in CD metrology
  • Advancement in overlay metrology
  • Advancement in defect inspection
  • Process control for CD and overlay
  • Emerging metrology technology
• LCD Application
  • Imaging technology
  • Process control
  • Material technology
  • Automation and productivity

Map for The event