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Photomask Japan 2010 – 17th International Symposium on Photomasks and NGL Masks in Japan

Event Details:

Start date : April 13, 2010
End date : April 15, 2010
Location : Annex Hall, Pacifico Yokohama, Yokohama
Organized by : PhotoMask Japan and SPIE

Event Description:

Photomask Japan 2010 is the 17th international symposium on photomasks and
NGL masks in Japan. The aim of the symposium is to bring together engineers
and investigators from Japan, USA, and all over the world in the field of photomasks,
NGL masks, and related technologies to discuss recent progress, applications,
and future trends. The conference program will feature invited papers, contributed
papers, poster sessions, and a rump session with panel discussion. Display opportunities
will be provided to mask manufacturing materials, and equipment companies.

Papers are solicited on the following and related topics:

  • Materials of and for Photomasks
  • Fabrication Process Steps and Equipments for Photomasks (process and equipments
    for developing, etching, cleaning etc.)
  • Photomask Writing Tools and Technologies
  • Metrology Tools and Technologies
  • Inspection Tools and Technologies
  • Repairing Tools and Technologies
  • Mask Data Preparations
  • EDA and DFM for Photomasks
  • Photomasks with RET: PSM, Masks with OPC
  • Photomask-relating Lithography Technologies
  • NGL Masks and Applications: EUV, Nano-imprint etc.
  • Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.

Map for The event



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